CMS

White Paper: VAISALA

Understand and utilize real-time data in CMP process optimize processes for supreme wafer quality and yeild Accurate and fast RI and RH measurements for optimized CMP tool performance   Did you know that the refractive index or RI measurement with an inline process refractometer is a safe, cost-effective, real-time, low-maintenance process monitoring method to accurately determine wet chemical concentrations?  Vaisala’s inline process refractometers meet industry standards and can be conveniently integrated into slurry blenders and CMP tools.  Relative humidity or RH measurements in slurry blending are critical to avoid slurry evaporation and eventual agglomeration. Recommended products are the Indigo520 with HMP7 and TMP1 for both temperature and relative humidity measurements directly in the CMP tool.  In this eBook, we discuss:  RI in process optimization  RH as a critical measurement  Installation position benefits Optimize processes for supreme wafer quality and yield Optimize processes for supreme wafer quality and yieldOptimize processes for supreme wafer quality and yield Optimize processes for supreme wafer quality and yield